> Abstract: [...] By finely tuning experimental parameters such as laser exposure time, the nanopatterning feature size ranging from 1–30 nm, and the resulting shapes from nanoscale elevated structures (nanoblister shape) to punched holes can be precisely modulated. This nanopatterning strategy achieves feature sizes at the sub-10 nm scale and represents an advancement toward fabricating all-2D material devices, setting new benchmark in nanoscale manufacturing for quantum and photonic technologies.
> Abstract: [...] By finely tuning experimental parameters such as laser exposure time, the nanopatterning feature size ranging from 1–30 nm, and the resulting shapes from nanoscale elevated structures (nanoblister shape) to punched holes can be precisely modulated. This nanopatterning strategy achieves feature sizes at the sub-10 nm scale and represents an advancement toward fabricating all-2D material devices, setting new benchmark in nanoscale manufacturing for quantum and photonic technologies.